Aluminum-doped zinc oxide (AZO) sputtering targets from Innovnano reportedly provide researchers with a highly optimized and cost-effective tool for the development of next-generation transparent conducting oxide (TCO) thin films. Recently, these targets have been used in a paper published in collaboration with the Centre for Renewable Energy Systems Technology (CREST), which outlines the importance of sputtering methods in thin film production.

The research paper, presented at the 42nd IEEE Photovoltaic Specialists conference in New Orleans in June, investigates RF and DC sputtering for the deposition of AZO. Pre-doped nanoparticles were hot pressed to form an AZO target with a 2% aluminum dopant concentration. DC and RF sputtering were compared, highlighting DC sputtering as the most applicable technique for industry with its faster deposition rate and optimal film quality.

“We always choose to use AZO targets from Innovnano for our research, as they consistently produce top-quality thin films and are the easiest to use of any AZO target we’ve worked with,” said Patrick Isherwood, researcher at CREST Laboratory.

Research-grade AZO sputtering targets are formed from a specifically developed range of nanostructured AZO powders that are produced using the company’s patented emulsion detonation synthesis (EDS) technique. The targets reportedly offer high electrical conductivity, enhanced mechanical and thermal properties and improved target lifetimes. According to the company, optimized grain sizes enable uniform heat dispersion during sputtering, which extends the lifetime of the target, and, combined with shorter sputtering times, results in lower thin film production costs for higher-quality end products.

 For more information, visit www.innovnano-materials.com.